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奧林巴斯生物物鏡
從能夠進(jìn)行長(zhǎng)期延時(shí)成像的硅油物鏡到大量采用了透明優(yōu)化技術(shù)的物鏡，比CLARITY、SeeDB、SCALEVIEW和新型PACT，以及成像深度為8 mm的RIMS和PARS，我們一直在創(chuàng)新高性能的物鏡解決方案，以滿(mǎn)足顯微鏡觀察的需求。
從能夠進(jìn)行長(zhǎng)期延時(shí)成像的硅油物鏡到大量采用了透明優(yōu)化技術(shù)的物鏡，比CLARITY、SeeDB、SCALEVIEW和新型PACT，以及成像深度為8 mm的RIMS和PARS，我們一直在創(chuàng)新高性能的物鏡解決方案，以滿(mǎn)足顯微鏡觀察的需求。
| 明場(chǎng)物鏡 | |
| PLCN4X | Plan achromat objective 4X/0.1, WD 18.5 4X平場(chǎng)消色差物鏡, NA 0.1, 工作距離18.5mm |
| PLCN10X | Plan achromat objective 10X/0.25, WD 10.6 10X平場(chǎng)消色差物鏡, NA 0.25, 工作距離10.6mm |
| PLCN20X | Plan achromat objective 20X/0.4, WD 1.2 20X平場(chǎng)消色差物鏡, NA 0.4, 工作距離1.2mm |
| PLCN40X | Plan achromat objective 40X/0.65, WD 0.6（spring） 40X平場(chǎng)消色差物鏡, NA 0.65, 工作距離0.6mm |
| PLCN60X | Plan achromat objective 60X/0.8, WD 0.2（spring） 60X平場(chǎng)消色差物鏡, NA 0.8, 工作距離0.2mm |
| PLCN100XO | Plan achromat objective 100X/1.25, WD 0.13（spring, oil） 100X平場(chǎng)消色差油浸物鏡, NA 1.25, 工作距離0.13mm |
| PLCN100XOI | Plan achromat objective 100X/0.6-1.25, WD 0.13（spring, oil, iris） 100X平場(chǎng)消色差油浸物鏡, NA 0.6-1.25, 工作距離0.13mm，帶虹彩光闌 |
| PLN2X | Plan achromat objective 2X/0.06, WD 5.8 2X平場(chǎng)消色差物鏡, NA 0.06, 工作距離5.8mm |
| PLN4X | Plan achromat objective 4X/0.1, WD 18.5 4X平場(chǎng)消色差物鏡, NA 0.1, 工作距離18.5mm |
| PLN10X | Plan achromat objective 10X/0.25, WD 10.6 10X平場(chǎng)消色差物鏡, NA 0.25, 工作距離10.6mm |
| PLN20X | Plan achromat objective 20X/0.4, WD 1.2（spring） 20X平場(chǎng)消色差物鏡, NA 0.4, 工作距離1.2mm |
| PLN40X | Plan achromat objective 40X/0.65, WD 0.6（spring） 40X平場(chǎng)消色差物鏡, NA 0.65, 工作距離0.6mm |
| PLN50XOI | Plan achromat objective 50X/0.9-0.5, WD 0.2（spring, iris, oil） 50X平場(chǎng)消色差油浸物鏡, NA 0.9-0.5, 工作距離0.2mm，帶虹彩光闌 |
| PLN100XO | Plan achromat objective 100X/1.25, WD 0.15（spring, oil） 100X平場(chǎng)消色差油浸物鏡, NA 1.25, 工作距離0.15mm |
| UPLFLN4X | U plan semi apochromat objective 4X/0.13, WD 17 4X平場(chǎng)半復(fù)消色差物鏡, NA 0.13, 工作距離17mm |
| UPLFLN10X2 | U Plan Semi Apochromat objective 10X/0.3, WD 10 10X平場(chǎng)半復(fù)消色差物鏡, NA 0.3, 工作距離10mm |
| UPLFLN20X | U plan semi apochromat objective 20X/0.5, WD 2.1 20X平場(chǎng)半復(fù)消色差物鏡, NA 0.5, 工作距離2.1mm |
| UPLFLN40X | U plan semi apochromat objective 40X/0.75, WD 0.51（spring） 40X平場(chǎng)半復(fù)消色差物鏡, NA 0.75, 工作距離0.51mm |
| UPLFLN60X | U plan semi apochromat objective 60X/0.9 WD 0.2 with correction collar（spring, c.c. 0.11-0.23） 60X平場(chǎng)半復(fù)消色差物鏡, NA 0.9, 工作距離0.2mm |
| UPLFLN60XOI | U plan semi apochromat objective 60X/1.25-0.65, WD 0.12（spring, iris, oil） 60X平場(chǎng)半復(fù)消色差油浸物鏡, NA 1.25-0.65, 工作距離0.12mm，帶虹彩光闌 |
| UPLFLN100XO2 | U Plan Semi Apochromat objective 100X/1.3, WD 0.2（spring, oil） 100X平場(chǎng)半復(fù)消色差油浸物鏡, NA 1.3, 工作距離0.2mm |
| UPLFLN100XOI2 | U Plan Semi Apochromat objective 100X/1.3-0.6, WD 0.2（spring, oil, iris） 100X平場(chǎng)半復(fù)消色差油浸物鏡, NA 1.3-0.6, 工作距離0.2mm，帶虹彩光闌 |
| PLFLN100X | Plan semi apochromat objective 100X/0.95, W.D. 0.2, including plastic case AZ9525 and cap AZ9526 100X平場(chǎng)半復(fù)消色差物鏡, NA 0.95, 工作距離0.2mm |
| UPLXAPO4X | U Plan XApochromat objective 4X/0.16, WD 13mm，Corrected wavelength400-1000nm. 4X 超平場(chǎng)復(fù)消色差物鏡，NA0.16, 工作距離13mm,色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO10X | U Plan XApochromat objective 10X/0.4, WD 3.1mm，Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. ZDC supported. 10X 超平場(chǎng)復(fù)消色差物鏡，NA0.4, 工作距離3.1mm，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO20X | U Plan XApochromat objective 20X/0.8, WD 0.6mm，Coverglass thickness 0.17mm，Spring，Corrected wavelength400-1000nm.ZDC supported. 20X 超平場(chǎng)復(fù)消色差物鏡，NA0.8, 工作距離0.6mm，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO40X | U Plan XApochromat objective 40X/0.95, WD 0.18mm，Coverglass thickness 0.11-0.23mm，Spring，Corrected wavelength400-1000nm.ZDC supported. 40X 超平場(chǎng)復(fù)消色差物鏡，NA0.95, 工作距離0.18mm，校正環(huán)，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO40XO | U Plan XApochromat objective 40X/1.4, WD 0.13mm（Spring，oil），Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. BFP1. ZDC supported. 40X 超平場(chǎng)復(fù)消色差油浸物鏡，NA1.4, 工作距離0.13mm，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO60XO | U Plan XApochromat objective 60X/1.42, WD 0.15mm（Spring，oil），Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. ZDC supported. 60X 超平場(chǎng)復(fù)消色差油浸物鏡，NA1.42, 工作距離0.15mm，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO100XO | U Plan XApochromat objective 100X/1.45, WD 0.13mm（Spring，oil），Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. ZDC supported. 100X 超平場(chǎng)復(fù)消色差油浸物鏡，NA1.45 工作距離0.13mm，色差校準(zhǔn)范圍400-1000nm。 |
| PLAPON1.25X | Plan apochromat objective 1.25X/0.04, WD 5.0 1.25X平場(chǎng)復(fù)消色差物鏡, NA 0.04, 工作距離5.0mm |
| PLAPON2X | Plan apochromat objective 2X/0.08, WD 6.2 2X平場(chǎng)復(fù)消色差物鏡, NA 0.08, 工作距離6.2mm |
| PLAPON60XOSC2 | Super chromatic aberration correction N.A 1.4 60X色差校正熒光共定位專(zhuān)用油浸物鏡, NA 1.4 |
| UCPLFLN20X | UIS2 objectives for cell culture, live cell, iPS cell, stem cell, etc. Suitable for typical inverted microscope application having high NA and wide observation area. Correction collar. NA0.7, WD 0.8-1.8. coverslip thickness 0-1.6（optimized for glass slip）. DIC is applicable（IX-DIC20）. 20X高分辨率長(zhǎng)工作距離平場(chǎng)半復(fù)消色差物鏡, NA 0.7, 工作距離0.8-1.8mm |
| LUCPLFLN20X | Long working distance Plan SemiApochromat objective 20X, NA 0.45, WD 6.6-7.8（c.c.0-2） 20X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差物鏡, NA 0.45, 工作距離6.6-7.8mm |
| LUCPLFLN40X | Long working distance Plan SemiApochromat objective 40X, NA 0.6, WD 2.7-4.0（c.c.0-2） 40X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差物鏡, NA 0.6, 工作距離2.7-4.0mm |
| LUCPLFLN60X | Long working distance Plan SemiApochromat objective 60X, NA 0.70, WD 1.5-2.2（c.c.0.1-1.3） 60X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差物鏡, NA 0.7, 工作距離1.5-2.2mm |
| 無(wú)蓋片物鏡 | |
| MPLN5X | M Plan Achromat objective 5X/N.A. 0.1, W.D. 20mm 5X物鏡, NA 0.1, 工作距離20mm |
| MPLFLN2.5X | M Plan Semi Apochromat Objective Lens 2.5x/N.A. 0.08, W.D. 10.7mm with depolarizer 2.5X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.08, 工作距離10.7mm |
| MPLFLN10X | M Plan Semi Apochromat objective lens 10x/N.A. 0.3, W.D. 11mm 10X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.3, 工作距離11mm |
| MPLFLN20X | M Plan Semi Apochromat objective lens 20x/N.A. 0.45, W.D. 3.1mm 20X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.45, 工作距離3.1mm |
| MPLFLN40X | M plan semi apochromat objective 40X/0.75, W.D. 0.63（spring） 40X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.75, 工作距離0.63mm |
| MPLFLN50X | M Plan Semi Apochromat objective lens 50x/N.A. 0.8, W.D. 1.0mm 50X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.8, 工作距離1.0mm |
| MPLFLN100X | M Plan Semi Apochromat objective lens 100x/N.A. 0.9, W.D. 1.0mm 100X平場(chǎng)半復(fù)消色差無(wú)蓋片物鏡, NA 0.9, 工作距離1.0mm |
| MPLAPON50X | M Plan Apochromat Objective Lens 50X/0.95, WD:0.35 50X平場(chǎng)復(fù)消色差無(wú)蓋片物鏡, NA 0.95, 工作距離0.35mm |
| MPLAPON60X | M plan apochromat objective 60X/0.90, W.D. 0.4,（spring） 60X平場(chǎng)復(fù)消色差無(wú)蓋片物鏡, NA 0.90, 工作距離0.4mm |
| MPLAPON100X | M Plan Apochromat Objective Lens 100X/0.95, WD:0.35 100X平場(chǎng)復(fù)消色差無(wú)蓋片物鏡, NA 0.95, 工作距離0.35mm |
| MPLAPON100XO2 | M plan Apochromat objective 100X/1.45 N, WD 0.13（oil） 100X平場(chǎng)復(fù)消色差無(wú)蓋片油浸物鏡, NA 1.45, 工作距離0.13mm |
| 偏光物鏡 | |
| PLN4XP | Plan achromat polarising objective 4X/0.1. WD 18.5 4X偏光物鏡, NA 0.1, 工作距離18.5mm |
| ACHN10XP | Achromat polarising objective 10X/0.25, WD 6 10X偏光物鏡, NA 0.25, 工作距離6mm |
| ACHN20XP | Achromat polarising objective 20X/0.4, WD 3 20X偏光物鏡, NA 0.4, 工作距離3mm |
| ACHN40XP | Achromat polarising objective 40X/0.65, WD 0.45（spring） 40X偏光物鏡, NA 0.65, 工作距離0.45mm |
| ACHN100XOP | Achromat polarising objective 100X/1.25, WD 0.13（spring, oil） 100X偏光物鏡, NA 1.25, 工作距離0.13mm |
| UPLFLN4XP | U Plan Semi apochromat polarizing objective 4X/0.13, W.D. 17.0 4X平場(chǎng)半復(fù)消色差偏光物鏡, NA 0.13, 工作距離17.0mm |
| UPLFLN10XP | U Plan Semi apochromat polarizing objective 10X/0.30, W.D. 10.0 10X平場(chǎng)半復(fù)消色差偏光物鏡, NA 0.30, 工作距離10.0mm |
| UPLFLN20XP | U Plan Semi apochromat polarizing objective 20X/0.50, W.D. 2.1 20X平場(chǎng)半復(fù)消色差偏光物鏡, NA 0.50, 工作距離2.1mm |
| UPLFLN40XP | U Plan Semi apochromat polarizing objective 40X/0.75, W.D. 0.51（spring） 40X平場(chǎng)半復(fù)消色差偏光物鏡, NA 0.75, 工作距離0.51mm |
| UPLFLN100XOP | U Plan Semi apochromat polarizing objective 100X/1.3, W.D. 0.2（spring） 100X平場(chǎng)半復(fù)消色差偏光油浸物鏡, NA 1.3, 工作距離0.2mm |
| PH物鏡 | |
| PLCN10XPH | Plan achromat phase contrast objective 10X/0.25, WD 10.6 10X平場(chǎng)消色差相差物鏡, NA 0.25, 工作距離10.6mm |
| PLCN20XPH | Plan achromat phase contrast objective 20X/0.4, WD 1.2（spring） 20X平場(chǎng)消色差相差物鏡, NA 0.4, 工作距離1.2mm |
| PLCN40XPH | Plan achromat phase contrast objective 40X/0.65, WD 0.6（spring） 40X平場(chǎng)消色差相差物鏡, NA 0.65, 工作距離0.6mm |
| PLCN100XOPH | Plan achromat phase contrast objective 100X/1.25, WD 0.15（spring, oil） 100X平場(chǎng)消色差相差油浸物鏡, NA 1.25, 工作距離0.15mm |
| PLN10XPH | Plan achromat phase objective 10X/0.25, WD 10.6 10X平場(chǎng)消色差相差物鏡, NA 0.25, 工作距離10.6mm |
| CPLN10XPH | Plan achromat phase objective 10X, NA 0.25, WD 10 10X相差物鏡, NA 0.25, 工作距離10mm |
| PLN20XPH | Plan achromat phase objective 20X/0.4, WD 1.2（spring） 20X平場(chǎng)消色差相差物鏡, NA 0.4, 工作距離1.2mm |
| PLN40XPH | Plan achromat phase objective 40X/0.65, WD 0.6（spring） 40X平場(chǎng)消色差相差物鏡, NA 0.65, 工作距離0.6mm |
| PLN100XOPH | Plan achromat phase objective 100X/1.25, WD 0.15（spring, oil） 100X平場(chǎng)消色差相差油浸物鏡, NA 1.25, 工作距離0.15mm |
| UPLFLN4XPH | U plan semi apochromat phase objective 4X/0.13, WD 17 4X平場(chǎng)半復(fù)消色差相差物鏡, NA 0.13, 工作距離17mm |
| UPLFLN10X2PH | U Plan Semi Apochromat phase objective 10X/0.3, WD 10 10X平場(chǎng)半復(fù)消色差相差物鏡, NA 0.3, 工作距離10mm |
| CPLFLN10XPH | Plan semi apochromat phase objecive 10X, NA 0.30, WD 9.5 10X平場(chǎng)半復(fù)相差物鏡, NA 0.3, 工作距離9.4mm |
| UPLFLN20XPH | U plan semi apochromat phase objective 20X/0.5, WD 1.6 20X平場(chǎng)半復(fù)消色差相差物鏡, NA 0.5, 工作距離1.6mm |
| UPLFLN40XPH | U plan semi apochromat phase objective 40X/0.75, WD 0.51（spring） 40X平場(chǎng)半復(fù)消色差相差物鏡, NA 0.75, 工作距離0.51mm |
| UPLFLN60XOIPH | U plan semi apochromat phase objective 60X/1.25-0.65, WD 0.12（spring, oil, iris） 60X平場(chǎng)半復(fù)消色差相差油浸物鏡, NA 1.25-0.65, 工作距離0.12mm，帶虹彩光闌 |
| UPLFLN100XO2PH | U Plan Semi Apochromat phase objective 100X/1.3, WD 0.2（spring, oil） 100X平場(chǎng)半復(fù)消色差相差油浸物鏡, NA 1.3, 工作距離0.2mm |
| UPLXAPO60XOPH | U Plan Xapochromat phase contrast objective 60X/1.42, WD 0.15mm（Spring，oil），Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. ZDC supported. 60X 超平場(chǎng)復(fù)消色差油浸相襯物鏡，NA1.42, 工作距離0.15mm，色差校準(zhǔn)范圍400-1000nm。 |
| UPLXAPO100XOPH | U Plan XApochromat phase contrast objective 100X/1.45, WD 0.13mm（Spring，oil），Coverglass thickness 0.17mm，Corrected wavelength400-1000nm. 100X 超平場(chǎng)復(fù)消色差油浸相襯物鏡，NA1.45 工作距離0.13mm，色差校準(zhǔn)范圍400-1000nm。 |
| LCACHN20XPH | Long working distance achromat phase objective 20X/0.4, WD 3.2 20X長(zhǎng)工作距離相差物鏡, NA 0.4, 工作距離3.2mm |
| LCACHN40XPH | Long working distance achromat phase objective 40X/0.55, WD 2.2 40X長(zhǎng)工作距離相差物鏡, NA 0.55, 工作距離2.2mm |
| UCPLFLN20XPH | UIS2 phase contrast objectives for cell culture, live cell, iPS cell, stem cell, etc. Suitable for typical inverted microscope application having high NA and wide observation area. Correction collar. NA0.7, WD 0.8-1.8. coverslip thickness 0-1.6（optimized for plastic）. 20X高分辨率長(zhǎng)工作距離平場(chǎng)半復(fù)消色差相差物鏡, NA 0.7, 工作距離0.8-1.8mm |
| LUCPLFLN20XPH | Long working distance plan semiapochromat phase objective 20X,NA 0.45, WD 6.6-7.8（c.c.0-2） 20X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差相差物鏡, NA 0.45, 工作距離6.6-7.8mm |
| LUCPLFLN40XPH | Long working distance plan semiapochromat phase objective 40X,NA 0.6,WD 3.0-4.2（c.c.0-2） 40X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差相差物鏡, NA 0.6, 工作距離3.0-4.2mm |
| LUCPLFLN60XPH | Long working distance plan semiapochlomat phase objective 60X,NA 0.70,WD 1.5-2.2（c.c.0.1-1.3） 60X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差相差物鏡, NA 0.7, 工作距離1.5-2.2mm |
| RC物鏡 | |
| CPLN10XRC | Plan achromat relief contrast objective 10X,NA 0.25, WD 9.7 10X浮雕相襯物鏡, NA 0.25, 工作距離9.7mm |
| LCACHN20XRC | Long working distance achromat relief contrast objective 20X/0.4, WD 2.8 20X長(zhǎng)工作距離浮雕相襯物鏡, NA 0.4, 工作距離2.8mm |
| LCACHN40XRC | Long working distance achromat relief contrast objective 40X/0.55, WD 1.9 40X長(zhǎng)工作距離浮雕相襯物鏡, NA 0.55, 工作距離1.9mm |
| CPLFLN10XRC | Plan semi apochromat relief contrast objective 10X, NA 0.30, WD 9.0 10X平場(chǎng)半復(fù)浮雕相襯物鏡, NA 0.3, 工作距離9.0mm |
| LUCPLFLN20XRC | Long working distance Plan SemiApochromat relief contrast objective 20X, NA 0.45, WD 6.6-7.8（c.c.0-2） 20X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差浮雕相襯物鏡, NA 0.45, 工作距離6.6-7.8mm |
| LUCPLFLN40XRC | Long working distance Plan SemiApochromat relief contrast objective 40X, NA 0.6, WD 3.0-4.2（c.c.0-2） 40X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差浮雕相襯物鏡, NA 0.6, 工作距離3.0-4.2mm |
| TIRF物鏡/超分辨物鏡 | |
| UPLAPO60XOHR | U Plan Apochromat High Resolution objective 60X/1.5, WD 0.11（ oil）with correction collar（cover glass:0.13-0.19, 23/37℃），BFP1. ZDC supported. 60X 平場(chǎng)復(fù)消色差高分辨率/TIRF油浸物鏡，NA1.5, 工作距離0.11mm，23/37℃蓋玻片厚度0.13-0.19mm校正環(huán) |
| UPLAPO100XOHR | U Plan Apochromat High Resolution objective 100X/1.5, WD 0.12（ oil）with correction collar（cover glass:0.13-0.19, 23/37℃）.ZDC supported. 100X 平場(chǎng)復(fù)消色差高分辨率/TIRF油浸物鏡，NA1.5, 工作距離0.12mm，23/37℃蓋玻片厚度0.13-0.19mm校正環(huán) |
| UAPON150XOTIRF | U Apochromat objective for TIRF microscopy 150X/1.45, W.D. 0.08, C.C. 0.13mm-0.19mm for 23 degrees and 37degrees,（oil, 340nm applicable） 150X TIRF專(zhuān)用物鏡, NA 1.45, 工作距離0.08mm |
| APON100XHOTIRF | UIS2 Objectives for TIRF application. High NA apochromatic correction 100X. Exclusive immersion oil is required from Cargille（Series M NA1.78）. NA1.7, WD 0.08, correction collar. DIC is applicable. 100X TIRF專(zhuān)用物鏡, NA 1.7, 工作距離0.08mm |
| HIGHINDEX-CG | HIGHINDEX-CG Cover slip for APON100XHOTIRF. Thickness 0.15mm, Diameter 20mm, 10pcs. High refractive index. This coverslip can be used for UIS1（APO100XOHR）as well. 100X TIRF物鏡專(zhuān)用蓋片 |
| 硅油物鏡 | |
| UPLSAPO30XS | U plan super apochromat objective 30X/1.05, WD 0.8（Silicone） 30X平場(chǎng)復(fù)消色差硅油物鏡, NA 1.05, 工作距離0.8mm |
| UPLSAPO30XSIR | U plan super apochromat objective 30X, NA1.05, WD 0.8mm, Silicone Immersion Objective lens, 400-1600nm applicable. 30X平場(chǎng)復(fù)消色差紅外高透過(guò)率硅油物鏡, NA 1.05, 工作距離0.8mm |
| UPLSAPO40XS | U plan super apochromat objective 40X/1.25, WD 0.3（Silicone） 40X平場(chǎng)復(fù)消色差硅油物鏡, NA 1.25, 工作距離0.3mm |
| UPLSAPO60XS2 | U plan super apochromat objective 60X/1.3, WD 0.3（spring, silicone） 60X平場(chǎng)復(fù)消色差硅油物鏡, NA 1.3, 工作距離0.3mm |
| UPLSAPO100XS | U plan super apochromat objective 100X, NA1.35, WD 0.2mm,（spring, silicone）with oil pan 100X平場(chǎng)復(fù)消色差硅油物鏡, NA 1.35, 工作距離0.2mm |
| SCALEVIEW物鏡 | |
| XLPLN25XSVMP2 | SCALEVIEW immersion objective for multi-photon 25X/1.0, W.D. 4.0mm with correction collar（c.c. 0-0.23）, 400-1600nm applicable. 25X多光子專(zhuān)用SCALEVIEW物鏡, NA 1.0, 工作距離4.0mm |
| XLSLPLN25XSVMP2 | SCALEVIEW immersion objective for multi-photon 25X/0.95, W.D. 8.0mm with correction collar（c.c. 0-0.23）, 400-1600nm applicable. 25X多光子專(zhuān)用SCALEVIEW物鏡, NA 0.95, 工作距離8.0mm |
| 水浸物鏡 | |
| UMPLFLN10XW | U M Plan Semi Apochromat water immersion objective 10X/0.3, W.D. 3.3mm. 340nm and IR-DIC（900nm）applicable 10X紅外高透過(guò)率水浸物鏡, NA 0.3, 工作距離3.3mm |
| UMPLFLN20XW | U M Plan Semi Apochromat water immersion objective 20X/0.5, W.D. 3.3mm. 340nm and IR-DIC（900nm）applicable 20X紅外高透過(guò)率水浸物鏡, NA 0.5, 工作距離3.3mm |
| LUMPLFLN40XW | Long working distance U M Plan Semi Apochromat water immersionobjective 40X/0.8, W.D. 3.3mm 340nm and IR-DIC（900nm）applicable 長(zhǎng)工作距離40X紅外高透過(guò)率水浸物鏡, NA 0.8, 工作距離3.3mm |
| LUMPLFLN60XW | Long working distance U M Plan Semi Apochromat water immersionobjective 60X/1.0, W.D. 2.0mm 340nm and IR-DIC（900nm）applicable 長(zhǎng)工作距離60X紅外高透過(guò)率水浸物鏡, NA 1.0, 工作距離2.0mm |
| LUMFLN60XW | Long working distance U M Semi Apochromat water immersion objective 60X/1.1, W.D.1.5mm.340nm and IR-DIC（900nm）applicable. Correction Collar. 長(zhǎng)工作距離60X紅外高透過(guò)率水浸物鏡, NA 1.1, 工作距離1.5mm |
| UPLSAPO60XW | U plan super apochromat water immersion objective 60X/1.2, WD 0.28 with correction collar（spring, c.c.0.15-0.2） 60X平場(chǎng)復(fù)消色差水鏡, NA 1.2, 工作距離0.28mm |
| XLUMPLFLN20XW | Long working distance semi apochromat water immersion objective 20X/1.0, W.D. 2.0mm, including caution tag AF9168（340nm applicable, 700-1000nm applicable） 20X長(zhǎng)工作距離半復(fù)消色差水鏡, NA 1.0, 工作距離2.0mm |
| XLPLN25XWMP2 | Water immersion objective for multi-photon 25X/1.05, W.D. 2.0mm with correction collar（c.c. 0-0.23）, 400-1600nm applicable. 25X多光子專(zhuān)用水浸物鏡, NA 1.05, 工作距離2.0mm |
| XLSLPLN25XGMP | High refractive index immersion（ne:1.41 to 1.52）objective for multi-photon 25X, NA1.0, WD 8.0mm with correction collar（cover glass:0-0.23, ne:1.41-1.52）, 400-1600nm applicable. 25X多光子專(zhuān)用高折射率介質(zhì)物鏡, NA 1.0, 工作距離8.0mm |
| 高紫外透過(guò)率物鏡 | |
| XLFLUOR2X/340 | Plan Semi Apochromat objective 2X/0.14, W.D. 21 2X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差紫外高透過(guò)率物鏡, NA 0.14, 工作距離21mm |
| XLFLUOR4X/340 | Long working distance Semi Apochromat objective 4X/0.28, W.D. 28.75（to be used in conjunction with U-SLRE, 340nm applicable） 4X長(zhǎng)工作距離平場(chǎng)半復(fù)消色差紫外高透過(guò)率物鏡, NA 0.28, 工作距離28.75mm |
| UAPON20XW340 | U apochromat water immersion objective 20X/0.70, W.D. 0.35（water, spring, 340nm applicable）,including storage case（body:AZ9525 and cap:AZ9526） 20X復(fù)消色差紫外高透過(guò)率水浸物鏡, NA 0.7, 工作距離0.35mm |
| UAPON40XW340 | U apochromat water immersion objective 40X/1.15, W.D. 0.25, C.C. 0.13mm-0.25mm（water, spring, 340nm applicable）, including storage case（body:AZ9525 and cap:AZ9526） 40X復(fù)消色差紫外高透過(guò)率水浸物鏡, NA 1.15, 工作距離0.25mm |
| UAPON40XO340-2 | U apochromat objective 40X/1.35, W.D. 0.1（oil, spring, 340nm applicable）, including storage case（body:AZ9525 and cap:AZ9526） 40X復(fù)消色差紫外高透過(guò)率水浸物鏡, NA 1.35, 工作距離0.1mm |
標(biāo)簽:
奧林巴斯生物物鏡
